离子注入:
离子注入技术在半导体工业中用于局部修改基体的组成和物理性质,特别是当硼、磷、砷等掺杂剂被引入时。这些机器上的电极和石墨保护屏由于受到离子轰击而造成严重侵蚀。
- 美尔森的细晶粒且高密度超纯净石墨能很好的抵御侵蚀。
- 美尔森还开发了一种玻璃碳浸渍“VCI”技术,进一步增强这些零件的强度,同时减少微粒的排放。
离子注入技术在半导体工业中用于局部修改基体的组成和物理性质,特别是当硼、磷、砷等掺杂剂被引入时。这些机器上的电极和石墨保护屏由于受到离子轰击而造成严重侵蚀。
美尔森提议由超纯净石墨制成的且带碳化硅涂层的设备可以满足这些要求。
这些专门的解决方案是我们在材料和精加工方面钻研的成果:
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+86 400 162 8288
Sales office
+82 25 98 00 71
Sales & Engineering
+33 (0)1 41 85 43 00
Sales & Engineering
+1 989-894 29 11
Sales & Engineering
+1 814 781 1234
Sales & Engineering
+86 400 162 8288
Sales office
+82 25 98 00 71
Sales & Engineering
+33 (0)1 41 85 43 00
Sales & Engineering
+1 989-894 29 11
Sales & Engineering
+1 814 781 1234
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